Product

Polishing pad

The polishing pad is made of a special microcellular foaming material, which is divided into polyurethane, damping cloth and non-woven cloth. It is used to process high flatness and finish requirements. The polishing pad is moderately soft and hard while maintaining porosity. This hardness can keep the polishing pad flat and consistent for life. The product has been developed for plane processing and grinding of various needs and substrate materials.
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Product description

Operating foreign series polishing pads

The polishing pad is made of a special microcellular foaming material, which is divided into polyurethane, damping cloth and non-woven cloth. It is used to process high flatness and finish requirements. The polishing pad is moderately soft and hard while maintaining porosity. This hardness can keep the polishing pad flat and consistent for life. The product has been developed for plane processing and grinding of various needs and substrate materials.

Main service markets:

Semiconductor substrate

Flat glass /lcd/fpd

Precision optics

Storage disk

Processing materials / applications include:

Semiconductor substrate / silicon wafer

Lcd/ flat panel display

Precision optics

Disk memory base plate

Disk drive head

Typical products:

Product model

Density（g/cm3）

HardnessC

Open caliber（um）

Compression ratio

Filler

Characteristic

Purpose

Remarks

7355

0.34

58

65

74

Damping cloth

Strong versatility

Rough and fine polishing of blue glass


1900

0.37

65

65

64

Damping cloth

High flatness

Rough and fine polishing of blue glass


2900

0.35

67

25

60

Damping cloth

High flatness



LP-66

0.40

78



polyurethane（CeO2）


Precision optics, glass disk


LP-57

0.32

88



polyurethane（ZrO2）


Precision optics, glass disk


GR-35

0.58

89



ZrO2


Liquid crystal conductive glass